Explore how Applied Materials’ Centura™ Xtera™ Epi system is transforming epitaxy for gate-all-around (GAA) transistors at the 2nm node and beyond. This animation dives into the nanosheet architecture and showcases Xtera’s ability to deliver void-free source/drain fill with over 40% improvement in cell-to-cell uniformity. Through fast-pulse cycling in a uniquely compact chamber, Xtera achieves superior performance with 50% lower gas usage and significant carbon footprint reduction. Watch atoms animate into place with precision, revealing how Xtera enables the smallest-volume epi reactor for advanced logic and memory scaling.

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